One fun fact about EUV lithography that I learned recently: the masks and optics all work by reflection, since EUV photons aren't very "optical"-- you either have a thin film that EUV ghosts right through, or a thick film that stops it. Changing the type of atom doesn't much matter, there's not really anything akin to a pigment for energetic photons that's also thin enough to be used for nanometre lithography.

But EUV doesn't like to reflect much, either, so the mirrors are made of stacks of metal films, which absorb a lot of the light and need active cooling. So that's the reason EUV sources have to be so much brighter than LUV sources: the optics eat most of the light getting it to the wafer.

EDIT: elaborating on UV optics.

The optics are reflective because almost everything absorbs EUV.

Or rather, stuff either absorbs EUV or doesn't absorb it. I edited the parent comment to elaborate.

I think it's that we don't have materials that can focus x-rays with refraction the way we do visible wavelengths. The alternatives are tricky.